ONYX-Φlux Control

Angstrom Sciences is internationally known for the cutting edge technology we bring to magnetron sputtering applications. We have now developed a method to control the plasma across the surface of the target. The ONYX-Φlux Control, (Flux Control) developed for both planar and circular magnetrons, allows the user to maximize uniformity or target utilization.

Category: Products

Description
Reviews (0)

Description

Control Uniformity

Programmable dwell time of the magnetic field at specific points on the target surface. Provides precise control of electrical and magnetic field crossing point to focus the erosion profile and tune uniformity.

Control Material Utilization

Sweeps the plasma across the target surface at a constant rate. Up to 65% Target Utilization can be achieved on flat planar targets with thicknesses up to 1.4″ (35mm) allowing for extremely long run times.

User Friendly Software

Intuitive user interface
Three user modes – Run, Edit, Manual
Touch screen technology
Input position of the plasma and dwell time

Total Commitment

Angstrom Sciences is dedicated to helping our customers develop the most productive and cost-effective thin film applications by providing the world’s most advanced magnetrons, high quality deposition materials, and comprehensive technical support. We stand by ready to ensure your satisfaction. That is why we back all of our magnetrons with a 2-year warranty, the longest in the industry.