Advances in High Power Impulse Magnetron Sputtering (HIPIMS) or High Impact Power Magnetron Sputtering have been realized by utilizing highly controllable power supply systems that can deliver short bursts of high current densities to a sputtering target.

Angstrom Sciences has developed a series of sputtering cathodes capable of sustaining continuous pulsed power densities greater than 1500 Watts/in2. Angstrom Sciences’ high power pulsed magnetron sputtering cathodes incorporate two additional cooling channels in the anode body and stem mounting to maintain optimum cooling during process operation.

Other features like various magnet arrays can be provided including automated adjustable designs to keep the field intensity at the target surface consistent through target life.